26 results
Metalized carbon nanotubes as a conductive material for energy storage devices
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- Journal:
- Journal of Materials Research / Volume 31 / Issue 15 / 15 August 2016
- Published online by Cambridge University Press:
- 15 July 2016, pp. 2284-2290
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- 15 August 2016
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Si/TiOx Core/Shell Nanowires with Branched Cathode Support Structures for Pt Catalysts in PEM Fuel Cells
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1497 / 2013
- Published online by Cambridge University Press:
- 28 March 2013, mrsf12-1497-k06-41
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- 2013
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Electrochemical catalytic behavior for platinum functionalized TiO2 nanotube arrays in PEM fuel cells
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- MRS Online Proceedings Library Archive / Volume 1497 / 2013
- Published online by Cambridge University Press:
- 28 March 2013, mrsf12-1497-k06-42
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- 2013
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Processing and functionalization of conductive substoichiometric TiO2 catalyst supports for PEM fuel cell applications
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- Journal of Materials Research / Volume 28 / Issue 3 / 14 February 2013
- Published online by Cambridge University Press:
- 17 October 2012, pp. 461-467
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- 14 February 2013
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On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenated amorphous silicon-oxycarbide
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- Journal:
- Journal of Materials Research / Volume 24 / Issue 8 / August 2009
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2561-2573
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- August 2009
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Phosphate-dependent DNA Immobilization on Hafnium Oxide for Bio-Sensing Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1191 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1191-OO12-04
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- 2009
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Low Temperature Copper Deposition by PE-ALD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1195 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1195-B12-05
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- 2009
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A study of ruthenium ultrathin film nucleation on pretreated SiO2 and Hf–silicate dielectric surfaces
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- Journal of Materials Research / Volume 22 / Issue 8 / August 2007
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2254-2264
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- August 2007
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Low-temperature plasma-enhanced atomic layer deposition growth of WNxCy from a novel precursor for barrier applications in nanoscale devices
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- Journal of Materials Research / Volume 22 / Issue 3 / March 2007
- Published online by Cambridge University Press:
- 03 March 2011, pp. 703-709
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- March 2007
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Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications
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- Journal:
- Journal of Materials Research / Volume 20 / Issue 6 / June 2005
- Published online by Cambridge University Press:
- 01 June 2005, pp. 1536-1543
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- June 2005
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Erbium-doped Amorphous- Si-C-O Matrix (a-SiCxOy:Er) - A Novel Silicon-based Material for Near-infrared Optoelectronic Applications
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- MRS Online Proceedings Library Archive / Volume 866 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, V6.5
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- 2005
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Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
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- Journal of Materials Research / Volume 19 / Issue 10 / October 2004
- Published online by Cambridge University Press:
- 01 October 2004, pp. 2947-2955
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- October 2004
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Atomic layer deposition of tantalum nitride for ultrathin liner applications in advanced copper metallization schemes
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- Journal of Materials Research / Volume 19 / Issue 2 / February 2004
- Published online by Cambridge University Press:
- 03 March 2011, pp. 447-453
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- February 2004
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Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications
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- Journal of Materials Research / Volume 18 / Issue 8 / August 2003
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- 31 January 2011, pp. 1868-1876
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- August 2003
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Effect of Plasma Pre-Treatment on Dewetting Properties of CVD Cu on CVDW2N Barrier Layer
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E3.9
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- 2003
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The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum-Based Thin Films for Copper Diffusion Barrier Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E10.4
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- 2003
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Optimization of Ultrathin ALD Tantalum Nitride Films for Zero-Thickness Liner Applications
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- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B11.3
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- 2002
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Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode Applications
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- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B2.4
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- 2002
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Characterization of Ruthenium and Ruthenium Oxide Thin Films deposited by Chemical Vapor Deposition for CMOS Gate Electrode Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N3.3
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- 2002
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Low Temperature Metal Organic Chemical Vapor Deposition of Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B4.11
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- 2002
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